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|Title=21st International Microprocesses and Nanotechnology Conference | |Title=21st International Microprocesses and Nanotechnology Conference | ||
|Type=Conference | |Type=Conference | ||
| − | | | + | |Official Website=http://imnc.jp |
| − | |||
|City=Fukuoka | |City=Fukuoka | ||
| − | |Country= | + | |Country=Country:JP |
| − | |||
|wikicfpId=3216 | |wikicfpId=3216 | ||
|pageCreator=127.0.0.1 | |pageCreator=127.0.0.1 | ||
| Line 14: | Line 12: | ||
|Start Date=Oct 27, 2008 | |Start Date=Oct 27, 2008 | ||
|End Date=Oct 30, 2008 | |End Date=Oct 30, 2008 | ||
| + | |Academic Field=Nanotechnology | ||
| + | |Event Status=as scheduled | ||
| + | |Event Mode=on site | ||
}} | }} | ||
| + | {{Event Deadline | ||
| + | |Submission Deadline=Jun 30, 2008 | ||
| + | }} | ||
| + | {{S Event}} | ||
<pre> | <pre> | ||
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2-4:Nano-Tool | 2-4:Nano-Tool | ||
3:Nanoimprint, Nanoprint and Rising Lithography | 3:Nanoimprint, Nanoprint and Rising Lithography | ||
| − | 4:Bio MEMS, Lab on a | + | 4:Bio MEMS, Lab on a Chip |
5:Microsystem Technology and MEMS | 5:Microsystem Technology and MEMS | ||
Latest revision as of 15:27, 19 October 2022
Deadlines
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| Submission |
Venue
Fukuoka, Japan
Warning: Venue is missing. The map might not show the exact location.
MNC 2008 SCOPE and SYMPOSIUM 1-1:DUV, VUV, EUV Lithography and Metrology 1-2:Electron- and Ion-Beam Lithography 1-3:Resist Materials and Processing 2-1:Nanodevices 2-2:Nanofabrication 2-3:Nanomaterials 2-4:Nano-Tool 3:Nanoimprint, Nanoprint and Rising Lithography 4:Bio MEMS, Lab on a Chip 5:Microsystem Technology and MEMS Symposium A. Lithography Technology for 32nm node device Symposium B. Sensor Applications of Micro- process and Nanotechnology Symposium C. Nanoimprint Technology Conference Site: JAL Resort Sea Hawk Hotel Fukuoka, Japan IMPORTANT DATE Abstract Deadline: June 30, 2008 Late News Paper : September 1, 2008 Registration: October , 2008 JJAP Proceeding October 30, 2008
This CfP was obtained from WikiCFP
