(mobo import Concept___Events_With_Academic_Fields-migrated) |
(mobo import Concept___Events-migrated) |
||
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|Homepage=imnc.jp | |Homepage=imnc.jp | ||
|City=Fukuoka | |City=Fukuoka | ||
− | |Country= | + | |Country=Country:JP |
|Submission deadline=Jun 30, 2008 | |Submission deadline=Jun 30, 2008 | ||
|wikicfpId=3216 | |wikicfpId=3216 | ||
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|End Date=Oct 30, 2008 | |End Date=Oct 30, 2008 | ||
|Academic Field=Nanotechnology | |Academic Field=Nanotechnology | ||
+ | |Event Status=as scheduled | ||
+ | |Event Mode=on site | ||
}} | }} | ||
Revision as of 14:41, 6 September 2022
MNC 2008 SCOPE and SYMPOSIUM 1-1:DUV, VUV, EUV Lithography and Metrology 1-2:Electron- and Ion-Beam Lithography 1-3:Resist Materials and Processing 2-1:Nanodevices 2-2:Nanofabrication 2-3:Nanomaterials 2-4:Nano-Tool 3:Nanoimprint, Nanoprint and Rising Lithography 4:Bio MEMS, Lab on a Chip 5:Microsystem Technology and MEMS Symposium A. Lithography Technology for 32nm node device Symposium B. Sensor Applications of Micro- process and Nanotechnology Symposium C. Nanoimprint Technology Conference Site: JAL Resort Sea Hawk Hotel Fukuoka, Japan IMPORTANT DATE Abstract Deadline: June 30, 2008 Late News Paper : September 1, 2008 Registration: October , 2008 JJAP Proceeding October 30, 2008
This CfP was obtained from WikiCFP